Fabrication of GaN‐based ridge waveguides with very smooth and vertical sidewalls by combined plasma dry etching and wet chemical etching

Fabrication of GaN‐based ridge waveguides with very smooth and vertical sidewalls by combined plasma dry etching and wet chemical etching is a research paper published in physica status solidi (a) (2015). On theSindex it has a DataRank of 0.396. It has been cited 13 times.