Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems is a research paper published in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena (1999). On theSindex it has a DataRank of 0.787. It has been cited 8 times, with 8 citing works in its 1-hop citation network.
Scored on demand from live citation data
DataRank reads this dataset's downstream impact straight off the citation graph — no black box, no proprietary weighting. How is this computed?
FAIR checklist signals are shown for context only and do not affect DataRank scoring.
We only score data papers we can read in full — never from an abstract alone.
Base Score Contribution
0.330
From this paper's citation signal
Citation Network Contribution
0.457
From 6 citing papers with measurable signal
FWCI
0.00
Citation Percentile
0.1%
Citation Trend
Fields of Study
Keywords
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