Ultimate Top-down Etching Processes for Future Nanoscale Devices: Advanced Neutral-Beam Etching is a research paper published in Japanese Journal of Applied Physics (2006). On theSindex it has a DataRank of 0.745. It has been cited 143 times.
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Base Score Contribution
0.745
From this paper's citation signal
Citation Network Contribution
0
Citation network not refreshed for this result
This paper's DataRank is currently driven only by its base citation score. Citation network data was not refreshed for this result.
Learn more about DataRank methodology →FWCI
4.46
Citation Percentile
0.9%
Citation Trend
Fields of Study
Keywords